Reduced channel length lightly doped drain transistor using a sub-amorphous large tilt angle implant to provide enhanced lateral diffusion

ABSTRACT

A method of reducing an effective channel length of a lightly doped drain transistor (50), includes the steps of forming a gate electrode (52) and a gate oxide (54) over a semiconductor substrate (56) and implanting a drain region (58) of the substrate (56) with a sub-amorphous large tilt angle implant to thereby supply interstitials (62) at a location under the gate oxide (54). The method also includes forming a lightly doped drain extension region (66) in the drain region (58) of the substrate (56) and forming a drain (70) in the drain region (58) and forming a source extension region (67) and a source (72) in a source region (60) of the substrate (56). Lastly, the method includes thermally treating the substrate (56), wherein the interstitials (62) enhance a lateral diffusion (84) under the gate oxide (54) without substantially impacting a vertical diffusion (86) of the extension regions (66, 67), thereby reducing the effective channel length without an increase in a junction depth of the drain (70) and the drain extension region (66) or the source (72) and the source extension region (67).

FIELD OF THE INVENTION

The present invention is generally directed toward integrated circuitmanufacturing and is more particularly related to a method of forming areduced channel length lightly doped drain (RCL-LDD) transistorstructure to thereby provide for a reduction in the effective channellength of the transistor without adversely increasing the verticaljunction depth of the LDD extension region.

BACKGROUND OF THE INVENTION

Transistor devices make up one of the integral components of today'sintegrated circuits. Consequently, a reduction in the size oftransistors (often called "scaling") is constantly being pursued. Priorart FIG. 1 is a fragmentary cross section diagram illustrating aconventional MOS type transistor 10. The transistor 10 consists of aconductive gate region 12 overlying a thin gate oxide 14 which overliesa substrate 16. The gate 12 and the gate oxide 14 are disposed between adrain region 18 and a source region 20 which are formed in the substrate16 having a channel region 22 located therebetween which underlies thegate 12 and the gate oxide 14.

As the conventional transistor 10 is scaled into the sub-micron range toreduce its dimensions and thereby improve the transistor packing densityon a chip, the transistor 10 begins to experience hot-carrier effects,as illustrated in prior art FIG. 2. These undesirable hot-carriereffects become more evident when the transistor 10 is scaled whilemaintaining the supply voltage constant or when the supply voltage isnot reduced as rapidly as the structural features of the transistor.

The hot-carrier effects are due to an increase in the electrical fieldwithin the channel region 22. The increased electric field causeselectrons in an inversion layer 26 to be accelerated (or "heated") to anextent that several different undesirable phenomena occur. Asillustrated in prior art FIG. 2, the hot-carrier effects can includecharge injection, substrate current and electron injection into the gateoxide 14. Perhaps the most crucial hot-carrier effect is the chargeinjection into the gate oxide 14 which damages the thin oxide and leadsto a time-dependent degradation of various transistor characteristicssuch as the threshold voltage (V_(T)), the linear transconductance(g_(m)) and the saturation current (I_(DSAT)).

One prior art solution which reduces the undesired hot-carrier effectsof traditional transistor structures is the lightly doped drain (LDD)transistor 30, which is illustrated in prior art FIG. 3. The LDDtransistor 30 includes the gate 12 and the gate oxide 14 formed in aconventional manner, wherein a lightly doped drain extension region 32is formed adjacent to the drain region 18 between the drain region 18and the channel 22. The lightly doped drain extension region 32typically reduces the electric field near the channel region 22 by about30-40 percent and thus the hot-carrier reliability of the transistor isgreatly improved. The extension region 32 reduces the electric field byeffectively dropping a portion of the drain voltage across the extensionregion 32.

As transistor designers continue to scale down the transistor devicedimensions, the junction depths of the source and drain regions (as wellas the lightly doped drain extension region) also need to be reduced(i.e., make the junctions more shallow). Junction depths must be reducedin conjunction with scaling in order to prevent short channel transistoreffects such as punchthrough and threshold voltage shift. Oneconventional approach to reducing the junction depth is to reduce theimplant energy used to form the junctions and reduce the diffusion ofthe junctions in the vertical direction. Reducing the effective channellength (to get higher drive current) using the conventional approach byenhanced lateral diffusion would be accompanied by deeper junctionsleading to degradation of short channel effects. Thus, using theconventional approach for a fixed gate size, the channel length cannotbe reduced using the prior art method since it would result in deeperjunctions. A smaller channel length would, however, be a benefit as itwould help to improve the drive current. Consequently, designers havebeen faced with the design trade-off of reducing junction depths (toreduce short channel effects) and having longer channel lengths (leadingto reduced drive current) as the transistor size is reduced.

It is an object of the present invention to overcome the limitation ofthe prior art by providing a decrease in the effective channel length tothereby provide for a reduced transistor sizing without experiencingtransistor degradation due to short channel effects associated withdeeper junctions. In other words, it is an object of the presentinvention to overcome the limitation posed by the conventional designmethods whereby the channel length for a given gate size cannot bereduced by providing deeper junctions, as that would lead to degradationof transistor performance.

SUMMARY OF THE INVENTION

The present invention relates to a method of reducing the effectivechannel length of a lightly doped drain transistor without substantiallyimpacting the junction depth of the source/drain and source/drainextension regions. Consequently, the invention allows for a reduction intransistor size without increasing the junction depth and thereby avoidsthe undesirable short channel effects associated with increased junctiondepths.

According to one aspect of the present invention a reduction in theeffective channel length of a transistor without an increase in thejunction depth is accomplished by performing a large tilt angle implantin conjunction with the formation of the source/drain and source/drainextension regions. The large tilt angle implant is a shallow implant andplaces interstitials near the lateral edge of the source/drain extensionregion under the gate oxide. The interstitials enhance the lateraldiffusion of the source/drain extension region without substantiallyaffecting the vertical diffusion of the source/drain and source/drainextension region. Consequently, the effective channel length of thetransistor is reduced without an appreciable increase in transistorjunction depth.

According to another aspect of the present invention, a first sidewallspacer is formed on the gate and the gate oxide prior to the large tiltangle implant. The first sidewall spacer has a thickness that adjuststhe lateral extent to which the interstitials are formed below the gateoxide. When the first sidewall spacer is thin, the interstitialssignificantly extend under the gate oxide; when the sidewall spacerthickness is increased, the lateral extent to which the interstitialsextend under the gate oxide is decreased. Consequently, the amount ofthe transistor gate-to-drain overlap capacitance can be customizedindependently of the junction depth of the drain and the drain extensionregion.

To the accomplishment of the foregoing and related ends, the inventioncomprises the features hereinafter fully described and particularlypointed out in the claims. The following description and the annexeddrawings set forth in detail certain illustrative embodiments of theinvention. These embodiments are indicative, however, of but a few ofthe various ways in which the principles of the invention may beemployed. Other objects, advantages and novel features of the inventionwill become apparent from the following detailed description of theinvention when considered in conjunction with the drawings.

BRIEF DESCRIPTION OF THE DRAWINGS

FIG. 1 is a fragmentary cross section diagram of a prior art MOStransistor structure;

FIG. 2 is a fragmentary cross section diagram illustrating hot-carriereffects associated with a prior art short channel type MOS transistorstructure;

FIG. 3 is a fragmentary cross section diagram illustrating a prior artlightly doped drain MOS transistor structure;

FIG. 4 is a fragmentary cross section diagram illustrating a gate and agate oxide formed on a semiconductor substrate;

FIG. 5 is a fragmentary cross section diagram illustrating the structureof FIG. 4, wherein a large tilt angle implant is performed in a drainregion and a source region of the substrate to form interstitials nearthe surface of the substrate that extend beneath a portion of the gateoxide;

FIG. 6 is a fragmentary cross section diagram illustrating the structureof FIG. 5, wherein a substantially zero degree tilt angle drainextension region implant is performed in the drain region and the sourceregion of the substrate;

FIG. 7 is a fragmentary cross section diagram illustrating the structureof FIG. 6, wherein sidewall spacers are formed on the gate oxide and thedrain region and a source region are exposed to a source/drain implant;

FIG. 8 is an amplified fragmentary cross section diagram of thestructure of FIG. 7 illustrating the enhanced lateral diffusion in thedrain extension region according to the present invention;

FIG. 9 is an amplified fragmentary cross section diagram illustratingthe lightly doped drain extension region of prior art FIG. 3;

FIG. 10 is an amplified fragmentary cross section diagram illustratingthe present invention prior to thermal treatment, wherein theinterstitials generated by the large tilt angle implant reside near thelateral edge of the lightly doped drain extension region;

FIG. 11 is a graph illustrating the dopant and interstitial profiles ofthe lightly doped drain extension region and the large tilt angleimplant in a vertical portion of the lightly doped drain extensionregion of FIG. 10 according to the present invention;

FIG. 12 is a graph illustrating the dopant and interstitial profiles ofthe lightly doped drain extension region and the large tilt angleimplant at a point close to the lateral edge of the lightly doped drainextension region of FIG. 10 according to the present invention;

FIG. 13 is a fragmentary cross section diagram illustrating anotheraspect of the present invention, wherein a large tilt angle implant isperformed after the formation of a first sidewall spacer to control thelateral location of interstitials formed by the implant;

FIG. 14 is a fragmentary cross section diagram illustrating an implantstep for forming the lightly doped extension regions; and

FIG. 15 is a fragmentary cross section diagram illustrating an implantstep for forming the source and drain regions of the transistor afterthe formation of a second sidewall spacer.

DETAILED DESCRIPTION OF THE INVENTION

The present invention will now be described with reference to thedrawings wherein like reference numerals are used to refer to likeelements throughout. One aspect of the present invention relates to amethod of improving the drive current capability as the transistor isscaled down without degrading the short channel characteristics. Theinvention overcomes what has conventionally been a design limitation byperforming a large tilt angle implant in conjunction with the formationof a lightly doped drain extension region. The large tilt angle implantis a shallow implant and generates interstitials near the surface of thesemiconductor substrate in a drain region that extend beneath the gateoxide near the lateral edge of the drain extension region. Theinterstitials near the lateral edge of the drain extension regionenhance the lateral diffusion of the drain extension region underneaththe gate oxide without substantially affecting the vertical diffusion ofthe drain and the drain extension region. Consequently, the effectivechannel length of the device is decreased without increasing the depthof the junctions, thereby allowing the drive current to be improved andminimizing hot-carrier effects without adversely affecting short channeleffects.

According to another aspect of the present invention, the reduction inthe effective channel length of the transistor may be customized byforming a sidewall spacer, wherein a thickness of the spacer dictatesthe extent to which the effective transistor channel length is reduced.For example, when the sidewall spacer is thick, the lateral edge of thelightly doped drain extension region and the interstitials generated bythe large tilt angle implant extend only slightly underneath the gateoxide, and wherein when the sidewall spacer is thin, the extensionregion and the interstitials extend substantially further underneath thegate oxide. Consequently, the amount to which the effective channellength is reduced may be customized by altering the thickness of thesidewall spacer. Furthermore, this feature may be achieved withoutsubstantially altering the junction depth of the device, therebyadvantageously improving the transistor drive current.

One embodiment of the present invention is illustrated in FIGS. 4-7 as aplurality of semiconductor processing steps. FIG. 4 is a fragmentarycross section diagram illustrating a transistor 50 including a gate 52overlying a gate oxide 54 which in turn overlies an N-well region 55 ina semiconductor substrate 56. The gate 52 and the gate oxide 54 separatethe transistor 50 into a drain region 58 and a source region 60.Preferably, the NMOS type transistors are shielded by a masking layer(not shown) to prevent exposure of the NMOS transistors areas to thesubsequent steps performed on the drain region 58 and the source region60, which will be described infra. One exemplary manner in which thetransistor 50 is fabricated is described below. Although the presentinvention is described in accordance with a preferred series offabrication steps, it should be understood that various manufacturingmethods may be utilized and each is contemplated as falling within thescope of the present invention.

The starting material is a single crystal silicon wafer. Typically, thesilicon wafer is a lightly doped <100> wafer forming the substrate 56 ora heavily doped <100> wafer with a lightly doped epitaxial layer at thesurface. A P-channel transistor is fabricated in the N-doped well 55within the lightly doped P-substrate 56. The N-well structure 55 isformed in any conventional manner such as by growing a thermal oxidelayer, depositing a nitride film via chemical vapor deposition (CVD),applying a mask which generally protects the silicon surface but exposesthe desired N-well areas, and implanting ions into the defined N-wellarea. The N-well ions are driven into the silicon by high temperaturecycling to form the N-well region 55 and an oxide layer is then grownover the N-well 55. A V_(T) threshold-adjust implant is then applied andthe surface of the silicon wafer is then stripped of the oxide andnitride/oxide layers and a new oxide/nitride mask layer is formed forfabricating isolation structures (not shown).

The resulting field oxide isolation regions are then grown to define anactive device region for the transistor 50. The nitride/oxide mask layeris subsequently removed from the active device region and the gate oxidelayer 54 is then grown overlying the N-well 55. A polysilicon gate layeris then deposited preferably by CVD and a mask is applied to pattern thepolysilicon into the gate structure 52. Although in this embodiment apolysilicon gate material is utilized, it should be understood that thepolysilicon material is exemplary and other materials such as metal mayalso be used in the present invention. After the gate 52 and the gateoxide 54 are formed, the masking layer (not shown) is created to shieldthe NMOS transistors areas from the subsequent implantation steps. In apreferred embodiment, the masking layer is composed of a conventionalphotoresist material of approximately 1,000 angstroms which is formedand patterned according to conventional deposition and etch techniques.In the above manner, the partially completed transistor 50 of FIG. 4 isformed.

In a preferred embodiment of the present invention, a large tilt angleimplant is then performed, as illustrated in FIG. 5. The large tiltangle implant is preferably performed at an angle θ of about 30-60°measured from a normal to the surface of the substrate 56. The largetilt angle is performed in both the drain region 70 and the sourceregion 72. To prevent shadowing, a quad implant is preferred, whereinfour implants of equal dose are performed at a wafer rotation angle 90degrees apart from each other. Thus, if, for example, a 40 degree tiltangle implant is performed it is completed in four steps. First, the 40degree tilt angle implant is performed at a wafer rotation angle of 0degrees, followed by three more implants at wafer rotation angles of 90,180 and 270 degrees, respectively. In addition, the implant ispreferably performed with a neutral species such as, for example,silicon or germanium. Alternatively, however, indium may also beutilized. The goal of the large tilt angle implant is not to form adopant profile, but rather to generate interstitials (i.e., siliconatoms that have been knocked off their lattice sites) in the regionsnear the surface of the N-well 55 (hereinafter referred to as the"interstitial regions" 62). Although indium is not a neutral species (itis a P type dopant), it aggressively out diffuses during a subsequentthermal treatment and therefore does not significantly contribute as animpurity dopant. Therefore indium functions in a manner similar tosilicon and germanium and effectively creates interstitials. Althoughsilicon, germanium and indium are disclosed, other neutral species orother dopants may be utilized and are contemplated as falling within thescope of the present invention.

The interstitial regions 62 are shallow due to the large tilt angleutilized for the implant and the selected implant energy (additionaldetails of the implantation energy will be discussed infra since theoptimization of the large tilt angle implant is preferably a function ofthe lightly doped drain extension region which will be discussedshortly). In addition, due to the significant tilt angle θ, theinterstitial regions 62 extend an extent 64 beneath the gate oxide 54.

The preferred concentration dose for the large tilt angle implantpreferably depends upon the implant species used. The dose maypreferably range between 10 to 30 percent of the amorphizing dose atroom temperature for the respective species. For example, a silicon doseof 2×10¹⁴ -6×10¹⁴ ions/cm² may be used when the silicon amorphizing doseis 2×10¹⁵ ions/cm² at room temperature. The amorphizing doses at roomtemperature for germanium and indium are 4×10¹⁴ and 1×10¹⁴ ions/cm²,respectively. The dose range to be used for germanium may be 4×10¹³ to1.2×10¹⁴ ions/cm² and for indium the dose range may be 1×10¹³ to 3×10¹³ions/cm². Although the concentration doses highlighted above arepreferred depending upon which implant species utilized, it should beunderstood that a wide range of doses may be utilized and arecontemplated as falling within the scope of the present invention.

The interstitials generated by the large tilt angle implant also help inreduction of channeling in the subsequent source/drain extension regionimplantation step, thereby advantageously helping to reduce the verticaldepth of the source/drain extension region junctions which aresubsequently formed in the drain region 58 and the source region 60.

After the formation of the interstitial regions 62, a lightly dopeddrain extension region 66 is formed in the drain region 58 and a lightlydoped source extension region 67 is formed in the source region 60, asillustrated in FIG. 6. Preferably, a BF₂ implant having a tilt angle ofapproximately zero degrees is performed to form the extension regions 66and 67, wherein the depth of the regions 66 and 67 are substantiallydeeper than the interstitial regions 62 (for example, approximately 600Angstroms). BF₂ is the preferred dopant for the extension regions 66 and67 because it has a substantial ionic weight and therefore amorphizesthe crystal lattice in the drain region 58 and the source region 60,thereby substantially reducing the channeling in subsequent implantationsteps which, as discussed above, advantageously aides in maintaining thedesired shallow junction depths. Alternatively, a boron (B) implant maybe used to form the extension regions 66 and 67. Due to boron beingsubstantially lighter than BF₂, however, the boron implant does notamorphize the drain region 58 and the source region 60, thereby makingthe regions 58 and 60 more susceptible to channeling during subsequentimplantation steps. Although the present invention is described inconjunction with BF₂ and B as exemplary dopant species, it should beunderstood that any P-type dopant may be used and is contemplated asfalling within the scope of the present invention.

The concentration dose of the BF₂ implant is preferably in the range ofabout 1×10¹⁴ -5×10¹⁵ ions/cm² and the implantation energy is about 30keV or less. As stated above, it is desirable for the interstitialregions 62 to be substantially more shallow than the extension regions66 and 67 so that the interstitials generated by the large tilt angleimplant will not enhance diffusion in the vertical direction duringsubsequent thermal treatment. The lateral edge of the extension regions66 and 67, however, substantially coincide with the lateral extent 64 ofthe interstitial regions 62 so that during subsequent thermal treatment,the interstitials enhance the lateral diffusion of the extension regions66 and 67 under the gate oxide 54, thereby reducing the effectivechannel length of the transistor 50.

It is desirable to make the interstitial regions 62 substantially moreshallow than the extension regions 66 and 67. In addition, theimplantation energy of the large tilt angle implant should be selectedto ensure that the interstitials are substantially shallower than thedopant profile of the extension regions 66 and 67 (for example, for a 5keV boron implant the large tilt angle silicon implantation energy maybe about 10 keV). Since the concentration doses and implantationenergies of both implant steps (the large tilt angle implant and thedrain extension region implant) may be varied over a wide range, theabove preferred embodiment is merely exemplary and it should beunderstood that any optimized combination of concentration doses andenergies that result in the interstitial regions 62 being substantiallyshallower than the extension regions 66 and 67 so that the interstitialsdo not substantially enhance diffusion in the vertical direction iscontemplated as falling within the scope of the present invention.

A suitable thickness (about 1,000 to 2,000 Angstroms) of oxide is formedover the transistor 50 via, for example, liquid phase oxide depositionand oxide sidewall spacers 68 are then formed, preferably by reactiveion etching (RIE), wherein the sidewall spacer 68 is about 0.1 micronthick, as illustrated in FIG. 7.

After the sidewall spacers 68 are formed, a source/drain ionimplantation step is performed to form a drain 70 and a source 72 in thedrain region 58 and the source region 60 of the N-well 55, respectively.The sidewall spacers 68 laterally shift the drain 70 and the source 72away from the gate 52 such that a portion of the extension regions 66and 67 are interposed between the regions 70 and 72 and a channel region74 which underlies the gate oxide 54.

The source/drain implant is preferably a zero degree tilt angle implantusing a P-type dopant (for example, BF₂) wherein the implantation doseis about 5×10¹⁴ -5×10¹⁵ ions/cm² with an implantation energy of about20-40 keV. In the above manner, the drain 70 and the source 72 areformed which are heavily doped P+ regions. Subsequent to thesource/drain implantation of FIG. 7, a rapid thermal anneal (RTA) isperformed, for example, at about 1,000° C. for about 30 seconds toactivate the dopant species and repair the lattice damage caused by theimplantations. Note that the above doses and energies are preferred,however, the invention also applies to doses and energies outside of theabove-mentioned ranges.

The RTA causes diffusion of the drain 70 and the source 72 and theextension regions 66 and 67 in both the lateral and vertical directions80 and 82, as illustrated in FIG. 8. The lateral diffusions 80 and 88and the vertical diffusions 82 and 86 experience diffusion governed byFick's law as well as enhanced diffusion of boron due to the pairing ofboron with silicon interstitials. However, the dopants under the gate 54are subjected to further lateral enhanced diffusion 84 which is due tothe interstitials formed by the large tilt angle implant. The enhancedlateral diffusion 84 is due to the interstitials pairing with theimpurity dopants (e.g., B/BF₂) which accelerate the diffusion. Since theinterstitials of regions 62 are located near the lateral edge of theextension regions 66 and 67, the enhanced diffusion occurs laterallyunder the gate oxide which reduces the effective length of the channel74. Likewise, since the interstitials are shallow (i.e., located nearthe surface) they are not located near the bottom profile of either theregions 70 and 72 or the extension regions 66 and 67. Consequently, theinterstitials do not appreciably contribute to the diffusion in thevertical direction.

Therefore the large tilt angle implant generates shallow interstitialswhich are located near the lateral edge of the extension regions 66 and67, thereby providing enhanced lateral diffusion without enhancedvertical diffusion and providing a reduction in the effective length ofthe channel 74 without increasing the junction depth of the regions 70and 72 and the extension regions 66 and 67.

FIG. 8 illustrates the diffusion caused by the RTA, wherein the dottedline illustrates the composite impurity dopant and interstitial profileprior to the RTA and the solid line represents the completed junctiondepth profile after the lateral, vertical and enhanced lateraldiffusions 80, 82, 84, 86 and 88, respectively.

The distance to which the drain extension region 66 extends below thegate oxide 54 is labeled in FIG. 8 as d₁. The distance d₁ is larger thanthat experienced in prior art LDD transistors due to the enhancedlateral diffusion 84 provided by the presence of interstitials near thelateral edge of the drain extension region 66. Conventionally, asillustrated in prior art FIG. 9, the distance d₂ to which the drainextension region extends below the gate oxide was dictated by Fick'stype diffusion and enhanced boron diffusion. d₁ of FIG. 8, however,results from Fick's diffusion, enhanced diffusion as well as lateralenhanced diffusion due to the presence of the interstitials provided bythe large tilt angle implant. Consequently d₁ >d₂, thereby resulting ina reduced effective channel length without the conventional trade-off ofincreased junction depths. Therefore according to the present inventiona reduced channel length transistor is provided without adverselyincreasing the source/drain extension junction depth.

The manner in which the present invention achieves the enhanced lateraldiffusion 84 without a substantial change in the vertical diffusions 82and 86 may be better understood in conjunction with FIGS. 10-12. In FIG.10, the impurity dopant and interstitial profiles of regions 62, 66 and70 are illustrated in an amplified cross section of the drain region 58of the transistor 50 near the gate 52 and the gate oxide 54. At a firstregion 90 (the vertical portion), the interstitial region 62 issubstantially more shallow than the drain extension region 66 andconsequently the distance between the tails of the interstitial region62 and the drain extension region 66 are far apart, which is illustratedin greater detail in the concentration profile of FIG. 11. Because ofthe significant distance between the interstitials and the tail of thedrain extension region 66 in the first region 90 the interstitials donot significantly contribute to the vertical diffusion of the drainextension region 66 and the drain 70 in the vertical direction.Conversely, in the second region 92 (the lateral portion), the lateraledge of the interstitial region 62 and the drain extension region 66 aresubstantially coincident, or at least relatively close together.Therefore the lateral tail of the interstitial region 62 and the drainextension region 66 are close together as illustrated in FIG. 12 and theinterstitials contribute significantly to the lateral diffusion of thedrain extension region 66. Since the lateral diffusion of the drainextension region 66 is aided by the presence of excess interstitials inthe interstitial region 62, the interstitial region 62 enhances thelateral diffusion near the surface of the transistor 50 as illustratedin FIG. 8, thereby reducing the effective channel length of thetransistor 50.

According to another embodiment of the present invention, a method ofcontrolling a gate-to-drain overlap capacitance for a reduced channellength lightly doped drain transistor (RCL-LDD) is disclosed. Asillustrated in FIG. 13, prior to a large tilt angle implant (asdiscussed above), first sidewall spacers 100 are formed on both sides ofthe gate oxide 54. Preferably, the first sidewall spacers 100 are formedvia a liquid phase oxide deposition followed by an RIE, however, othermethods of forming the sidewall spacers 100 are contemplated by thepresent invention. The first sidewall spacers 100 have a thickness Dwhich can be adjusted based on the oxide thickness deposited and the RIEperformed. The thickness D is preferably adjusted to customize theamount of gate-to-drain overlap (C_(gdo)) of the transistor 50.

Although the present invention, as illustrated in FIG. 8, substantiallyreduces the channel length without an appreciable increase in junctiondepth, the enhanced lateral diffusion also increases the overlapcapacitance created by the gate 52 and the drain extension region 66,with the gate oxide 54 as the dielectric. The increase in gate-to-draincapacitance (C_(gdo)) undesirably results in a decrease in transistorswitching speed since the amount of time needed to discharge the gate 52will increase as C_(gdo) increases. In some cases a designer may wish tocustomize the C_(gdo) to trade-off transistor drive current andtransistor switching speed. In such an In such an instance, an increasein the thickness of the first sidewall spacers 100 will increase theeffective channel length while reducing the drain-to-gate overlapcapacitance C_(gdo).

After forming the first sidewall spacers 100, a large tilt angle implantis performed to generate interstitials that are near the surface of theN-well 55. The thickness of the sidewall spacers 100 dictate the extentto which the interstitial regions 62 and the extension regions 66 and 67extend underneath the gate oxide 52. If the sidewall spacers 100 arevery thin (for example, about 100 Angstroms), the decrease in thedrain-to-gate overlap capacitance is small and if the sidewall spacers100 are thicker (for example, about 200 Angstroms), the drain-to-gateoverlap capacitance may be reduced. However, for the wider spacer 100the source/drain series resistance increases. In the above manner, thefirst sidewall spacer 100 of the present invention allows for thecustomization of the drain-to-gate capacitance and source/drain seriesresistance (and therefore the effective channel length of the transistor50) for optimum transistor performance without impacting the junctiondepths.

Like the previous embodiment, it is preferred that the sub-amorphouslarge tilt angle implant precede the extension region implant to createenough damage near the surface of the N-well region 55 to thereby reducethe potential of channeling during the extension region implant. Thepresent invention, however, also contemplates performing the large tiltangle implant after the extension region implant. The large tilt angleimplant is preferably a neutral species or an impurity dopant thatsubstantially out diffuses during annealing such as indium, as wasdiscussed above in the previous embodiment.

A extension region implant is then performed in a manner similar to theprevious embodiment; subsequently, second sidewall spacers 102 areformed on the first sidewall spacers 100. The second sidewall spacers102 substantially correspond to the spacers 68 of FIG. 7, wherein thesidewall spacers 102 laterally displace the drain 70 and the source 72in the N-well 55 so that a portion of the extension regions 66 and 67are disposed between the regions 70 and 72 and the channel 74. Afterformation of the drain 70 and the source 72 through a source/drainimplantation step, an RTA is performed, wherein the extension regions 66and 67 experience enhanced lateral diffusion due to the interstitialsnear the surface that underlie the gate oxide 52.

Although the invention has been shown and described with respect to acertain preferred embodiment or embodiments, it is obvious thatequivalent alterations and modifications will occur to others skilled inthe art upon the reading and understanding of this specification and theannexed drawings. In particular regard to the various functionsperformed by the above described components (assemblies, devices,circuits, etc.), the terms (including a reference to a "means") used todescribe such components are intended to correspond, unless otherwiseindicated, to any component which performs the specified function of thedescribed component (i.e., that is functionally equivalent), even thoughnot structurally equivalent to the disclosed structure which performsthe function in the herein illustrated exemplary embodiments of theinvention. In addition, while a particular feature of the invention mayhave been disclosed with respect to only one of several embodiments,such feature may be combined with one or more other features of theother embodiments as may be desired and advantageous for any given orparticular application.

What is claimed is:
 1. A method of reducing an effective channel lengthof a lightly doped drain transistor, comprising the steps of:forming agate electrode and a gate oxide over a semiconductor substrate;implanting a region of the substrate where a drain is formed with alarge tilt angle implant which supplies interstitials at a locationunder the gate oxide; forming a lightly doped drain extension region inthe region of the substrate where the drain is formed; forming a drainin the region where the drain is formed and a source in a source regionof the substrate; and thermally treating the substrate, wherein theinterstitials enhance a lateral diffusion under the gate oxide withoutsubstantially impacting a vertical diffusion of the extension region,thereby reducing the effective channel length without an increase in ajunction depth of the drain and the drain extension region.
 2. Themethod of claim 1, wherein the tilt angle is in the range of about30-60°.
 3. The method of claim 1, wherein the step of implanting theregion where the drain is formed with the large tilt angle implantprecedes the step of forming the lightly doped drain extension region.4. The method of claim 1, wherein the step of implanting the regionwhere the drain is formed with the large tilt angle implant comprisesimplanting one of silicon, germanium or indium.
 5. A method of reducingan effective channel length of a lightly doped drain transistor,comprising the steps of:forming a gate electrode and a gate oxide over asemiconductor substrate; implanting a region of the substrate where adrain is formed with a large tilt angle implant which suppliesinterstitials at a location under the gate oxide, wherein the step ofimplanting the region where the drain is formed with the large tiltangle implant comprises implanting a sub-amorphous dose into the drainregion; forming a lightly doped drain extension region in the region ofthe substrate where the drain is formed; forming a drain in the regionwhere the drain is formed and a source in a source region of thesubstrate; and thermally treating the substrate, wherein theinterstitials enhance a lateral diffusion under the gate oxide withoutsubstantially impacting a vertical diffusion of the extension region,thereby reducing the effective channel length without an increase in ajunction depth of the drain and the drain extension region.
 6. A methodof reducing an effective channel length of a lightly doped draintransistor, comprising the steps of:forming a gate electrode and a gateoxide over a semiconductor substrate; implanting a region of thesubstrate where a drain is formed with a large tilt angle implant whichsupplies interstitials at a location under the gate oxide, wherein adose of the large tilt angle implant is about 10-30 percent of anamorphizing dose; forming a lightly doped drain extension region in theregion of the substrate where the drain is formed; forming a drain inthe region where the drain is formed and a source in a source region ofthe substrate; and thermally treating the substrate, wherein theinterstitials enhance a lateral diffusion under the gate oxide withoutsubstantially impacting a vertical diffusion of the extension region,thereby reducing the effective channel length without an increase in ajunction depth of the drain and the drain extension region.
 7. Themethod of claim 1, wherein the step of thermally treating the substratecomprises performing a rapid thermal anneal.
 8. The method of claim 1,wherein a composite doping profile and interstitial profile under thegate oxide comprises a large concentration gradient along a lateral edgeof the drain extension region and a substantially smaller concentrationgradient along a bottom portion of the drain extension region, therebyresulting in an enhanced lateral diffusion under the gate oxide.
 9. Amethod of reducing an effective channel length of a lightly doped draintransistor, comprising the steps of:forming a gate electrode and a gateoxide over a semiconductor substrate; implanting a region of thesubstrate where a drain is formed with a large tilt angle implant whichsupplies interstitials at a location under the gate oxide; forming alightly doped drain extension region in the region of the substratewhere the drain is formed; forming a drain in the region where the drainis formed and a source in a source region of the substrate; andthermally treating the substrate, wherein the interstitials enhance alateral diffusion under the gate oxide without substantially impacting avertical diffusion of the extension region, thereby reducing theeffective channel length without an increase in a junction depth of thedrain and the drain extension region, further comprising the step offorming a first sidewall spacer on a drain side of the gate and the gateoxide before the implanting of the region where the drain is formed withthe large tilt angle implant, wherein a thickness of the first sidewallspacer controls the location of dopants under the gate oxide, therebyallowing the reduce channel length of the transistor to be customized.10. The method of claim 9, further comprising the step of forming asecond sidewall spacer adjacent to the first sidewall spacer before theforming of the drain, wherein the drain region and the drain extensionregion overlap and the second sidewall spacer laterally staggers thedrain region and the drain extension region.
 11. The method of claim 1,further comprising the step of implanting the source region of thesubstrate with the large tilt angle implant, thereby supplyinginterstitials at a location in the source region under the gate oxide.12. The method of claim 1, wherein implanting the drain region with thelarge tilt angle implant comprises performing a quad implant.
 13. Themethod of claim 1, further comprising the step of forming a lightlydoped source extension region in the source region of the substrate atthe same time the lightly doped drain extension region is formed.
 14. Amethod of forming a transistor, comprising the steps of:forming a gateelectrode and a gate oxide over a semiconductor substrate; supplyinginterstitials in at least one of a region of the substrate where a drainis formed and a region of the substrate where a source is formed;forming an extension region in the at least one of the region where thedrain is formed and the region where the source is formed; forming adrain in the region where the drain is formed and a source in a regionwhere the source is formed; and thermally treating the substrate,wherein the interstitials enhance a lateral diffusion under the gateoxide without substantially impacting a vertical diffusion of theextension region, thereby reducing the effective channel length withoutan increase in a junction depth of the extension region.
 15. The methodof claim 14, wherein the step of supplying interstitials comprises thestep of implanting at least one of the region where the drain is formedand the region where the source is formed with a large tilt angleimplant, thereby supplying interstitials at a location under the gateoxide.